Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-12-13
2010-12-07
Ngueyn, Nam X (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C118S620000, C118S621000, C118S7230AN, C204S298010, C204S298310, C156S345100
Reexamination Certificate
active
07846310
ABSTRACT:
A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.
REFERENCES:
patent: 4894510 (1990-01-01), Nakanishi et al.
patent: 5985092 (1999-11-01), Chiu et al.
patent: 2005/0263390 (2005-12-01), Gung et al.
Gillard Andrew
Miller Keith A.
Vesci Anthony
Applied Materials Inc.
Berman Jason M
Law Offices of Charles Guenzer
Ngueyn Nam X
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