Enabling chain scission of branched photoresist

Details Enabling chain scission of branched photoresist Enabling chain scission of branched photoresist

2007-01-23

2007-01-23

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S908000, C430S910000, C522S002000, C522S130000, C522S163000, C522S165000, C522S914000

Reexamination Certificate

active

10964200

ABSTRACT:
By using a branched long chained chain scission polymer as a photoresist for EUV and 157 nanometer applications, a relatively higher molecular weight polymer with good mechanical properties may be achieved. In addition, by using chain scission technology, line edge roughness and resolution may be improved at the same time.

REFERENCES:
patent: 4897336 (1990-01-01), Chien
patent: 5214110 (1993-05-01), Ahad
patent: 5919442 (1999-07-01), Yin et al.
patent: 6872505 (2005-03-01), Cao et al.

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