Emulsion for making dry film resists

Details Emulsion for making dry film resists Emulsion for making dry film resists

1980-09-23

1982-07-27

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430314, 430921, 430925, 20415918, 20415923, 20415924, G03C 168

Patent

active

043418597

ABSTRACT:
A resist film composed of a water-soluble polyvinyl alcohol, a water-soluble thermosetting polymethylol cross-linking agent and a polyaryl iodonium or sulfonium salt of a complex halogenide as catalyst, when irradiated with ultraviolet light and then heated, or when heated and irradiated with ultraviolet light, under a circuit mask, provides a latent image which is developable by water alone.

REFERENCES:
patent: 4026705 (1977-05-01), Crivello et al.
patent: 4090936 (1978-05-01), Barton
patent: 4138255 (1979-02-01), Crivello
patent: 4161476 (1979-07-01), Crivello
De Forest, Photoresist Materials and Processes, 1975 pp. 78-80.

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