Coating apparatus – Gas or vapor deposition
Patent
1997-09-05
2000-12-19
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
20429811, 118715, C23C 1400, C23C 1600
Patent
active
061622974
ABSTRACT:
A semiconductor fabrication equipment component which is exposed to a film layer fabrication environment exhibits a surface which is embossed with a pattern to provide an enhanced surface area for particle retention. The component is fabricatable using numerous embossing techniques, including knurling. The embossed surface provides the enhanced surface area without imposing a particle load on the treated part.
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Huo David Datong
Mintz Donald M.
Sharp Lolita
Subramani Anantha
Applied Materials Inc.
Lund Jeffrie R
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