X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1980-02-07
1985-08-20
Schilling, Richard L.
X-ray or gamma ray systems or devices
Specific application
Lithography
427160, 427258, 427264, 427270, 2505051, 2505151, 430 5, G21C 1100, G02B 500, G03F 1100, B05B 500
Patent
active
045368821
ABSTRACT:
A mask which is especially useful in X-ray lithography wherein the X-ray absorber material is embedded in the mask membrane.
REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 3892973 (1975-07-01), Coquin et al.
patent: 4037111 (1977-07-01), Coquin et al.
Jones Addison B.
Plonski Siegfried G.
Hamann H. Fredrick
McGlynn Daniel R.
Rockwell International Corporation
Schilling Richard L.
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