Embedded absorber X-ray mask and method for making same

X-ray or gamma ray systems or devices – Specific application – Lithography

Patent

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Details

427160, 427258, 427264, 427270, 2505051, 2505151, 430 5, G21C 1100, G02B 500, G03F 1100, B05B 500

Patent

active

045368821

ABSTRACT:
A mask which is especially useful in X-ray lithography wherein the X-ray absorber material is embedded in the mask membrane.

REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 3892973 (1975-07-01), Coquin et al.
patent: 4037111 (1977-07-01), Coquin et al.

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