Eliminating microbubbles in developer solutions to reduce photor

Details Eliminating microbubbles in developer solutions to reduce photor Eliminating microbubbles in developer solutions to reduce photor

1996-12-09

1999-02-09

Shaver, Kevin P.

Dispensing

Processes of dispensing

137205, 137208, 137209, 222 61, 222 64, 222152, 222394, B67D 508

Patent

active

058682783

ABSTRACT:
Defects, associated with the presence of microbubbles in the photoresist developer solution, have been largely eliminated by providing an apparatus and method whereby the photoresist developer solution, while on standby status in a buffer tank, is maintained at a negative pressure (about minus 0.5 kg/cm.sup.2). This allows any microbubbles, that were introduced into the solution during the course of conveying it to the buffer, to escape. The negative pressure in the buffer during its refill and standby stages is generated by adding a venturi valve to the existing equipment. This keeps the impact on the control software to a minimum and has little or no effect on the cost of the process.

REFERENCES:
patent: 4199472 (1980-04-01), Rollison
patent: 4601409 (1986-07-01), DiRegolo
patent: 5148945 (1992-09-01), Geatz
patent: 5330072 (1994-07-01), Ferri, Jr. et al.
patent: 5347863 (1994-09-01), Richard
patent: 5490611 (1996-02-01), Bernosky et al.
patent: 5607000 (1997-03-01), Cripe et al.
patent: 5636762 (1997-06-01), Juhola et al.

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