Elevated source and drain elements for strained-channel...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S384000, C257SE29268

Reexamination Certificate

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07615829

ABSTRACT:
A semiconductor structure having a surface layer disposed over a substrate, the surface layer including strained silicon. A contact layer is disposed over a portion of the surface layer, the contact layer including a metal-semiconductor alloy. A bottommost boundary of the contact layer is disposed above a bottommost boundary of the surface layer.

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