Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-03-06
2000-03-07
Loke, Steven H.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257347, 257350, 257546, H01L 2362, H01L 2701, H01L 2712, H01L 2900
Patent
active
060343990
ABSTRACT:
An ESD protection arrangement for a silicon-on-insulator device has an N-well type implant in the silicon substrate of the device, a p.sup.+ implant forming a juncture with the N-well type implant, and an n.sup.+ implant defining a juncture with the N-well type implant, in order to protect against negative transients and positive transients. At the p-channel threshold adjust, both the p-channel of the device and the N-well are implanted. Implanting the N-well to a depth of about 0.15 to about 0.30 .mu.m provides suitable characteristics for both the N-well and the p-channel.
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IBM Technical Disclosure Bulletin, vol. 16, No. 3, pp. 1027-1029, Aug. 1973 .
Bertin Robert C.
Brady Frederick T.
Lockheed Martin Corporation
Loke Steven H.
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