Electrostatic deflection system for corpuscular radiation

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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Reexamination Certificate

active

07491946

ABSTRACT:
The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

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patent: 5-129193 (1993-05-01), None

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