Electrostatic chucks having barrier layer

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

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C361S233000, C428S032710, C428S049000

Reexamination Certificate

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11102542

ABSTRACT:
An electrostatic chuck for supporting a semiconductor wafer, including: a chuck body having a dielectric region and an insulating region, the insulating region having a higher electrical resistivity than the dielectric region, an electrode embedded in the chuck body, and a barrier layer provided between dielectric region and the insulating region.

REFERENCES:
patent: 5998321 (1999-12-01), Katsuda et al.
patent: 6001760 (1999-12-01), Katsuda et al.
patent: 6071630 (2000-06-01), Tomaru et al.
patent: 6204489 (2001-03-01), Katsuda et al.
patent: 6452775 (2002-09-01), Nakajima
patent: 6723274 (2004-04-01), Divakar
patent: 7011874 (2006-03-01), Ito et al.
patent: 7042697 (2006-05-01), Tsuruta et al.
patent: 2003/0029569 (2003-02-01), Natsuhara et al.
patent: 1 156 522 (2001-11-01), None

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