Electrostatic chucks

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Patent

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H01T 2000

Patent

active

046928367

ABSTRACT:
In an electrostatic chuck of the type wherein an electrode is covered by an insulating dielectric member, an object, typically a semiconductor wafer, to be electrostatically attracted is mounted on the dielectric member, and a potential difference is applied across the wafer and the electrode, the electrode is shaped such that the distribution of the electrostatic attractive force applied to the wafer would not be uniform throughout the attractive surface of the chuck. To this end the electrode is constituted by a plurality of spaced rings or bars or provided with a plurality of circumferentially spaced radial members. When the wafer is flexed downwardly, the thickness of the dielectric member is varied continuously from one to the other end. Where the electrode is divided into a plurality of split electrodes, variable resistors are provided to apply the same or different DC voltages to the split electrodes.

REFERENCES:
patent: 4384918 (1983-05-01), Abe
patent: 4520421 (1985-05-01), Sakitani et al.

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