Electrostatic chucking stage and substrate processing apparatus

Details Electrostatic chucking stage and substrate processing apparatus Electrostatic chucking stage and substrate processing apparatus

2011-03-01

2011-03-01

Kackar, Ram N. (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S724000, C118S728000, C361S234000, C279S128000, C156S345530

Reissue Patent

active

RE042175

ABSTRACT:
This application discloses the structure of an ESC stage where a chucking electrode is sandwiched by a moderation layer and a covering layer. The moderation layer and the covering layer have the thermal expansion coefficients between the dielectric plate and the chucking electrode. This application also discloses the structure of an ESC stage where a chucking electrode is sandwiched by a moderation layer and a covering layer, which have internal stress directed oppositely to that of the chucking electrode. This application further discloses a substrate processing apparatus for carrying out a process onto a substrate as the substrate is maintained at a temperature higher than room temperature, comprising the electrostatic chucking stage for holding the substrate during the process.

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