Electrostatic chucking device and manufacturing method thereof

Details Electrostatic chucking device and manufacturing method thereof Electrostatic chucking device and manufacturing method thereof

2004-02-10

2008-08-12

Tran, Thao (Department: 1794)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C428S334000, C428S339000, C428S450000, C428S473500

Reexamination Certificate

active

07411773

ABSTRACT:
An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The first and second insulation layers are formed from polyimide films. At least one adhesion layer is provided between the metal substrate and the first insulation layer, and is a thermoplastic polyimide-based adhesive film having a film thickness of 5 to 50 μm.

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