Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1995-06-06
1996-10-01
Fleming, Fritz M.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
055615856
ABSTRACT:
An electrostatic chuck has its electrodes biased with respect to the self-bias potential induced by the plasma on the wafer, thereby providing improved resistance to breakdown in spite of variation of the wafer potential during processing. An alternate embodiment further suppresses the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck by the interposition of a conductive guard ring at the self-bias potential, thereby defining an equipotential area between the closest electrode and the wafer.
REFERENCES:
patent: 5400209 (1995-03-01), Moslehi
patent: 5436790 (1995-01-01), Blake et al.
patent: 5444597 (1995-08-01), Blake et al.
patent: 5467249 (1995-11-01), Westerfield et al.
Barnes Michael S.
Keller John H.
Logan Joseph S.
Tompkins Robert E.
Westerfield, Jr. Robert P.
Fleming Fritz M.
International Business Machines - Corporation
LandOfFree
Electrostatic chuck with reference electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck with reference electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck with reference electrode will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1506800