Electrostatic chuck with reference electrode

Details Electrostatic chuck with reference electrode Electrostatic chuck with reference electrode

1993-12-20

1995-11-14

Gaffin, Jeffrey A.

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

269 8, 279128, H02N 1300

Patent

active

054672490

ABSTRACT:
An electrostatic chuck has its electrodes biased with respect to the self-bias potential induced by the plasma on the wafer, thereby providing improved resistance to breakdown in spite of variation of the wafer potential during processing, further suppressing the formation of vacuum arcs between the back of the wafer being processed and the body of the chuck by the interposition of a conductive guard ring at the self-bias potential, thereby defining an equipotential area between the closest electrode and the wafer.

REFERENCES:
patent: 4554611 (1985-11-01), Lewin
patent: 5055964 (1991-10-01), Logan et al.
patent: 5103367 (1992-04-01), Horwitz et al.
patent: 5213349 (1993-05-01), Elliot
patent: 5255153 (1993-10-01), Nozawa et al.
patent: 5350479 (1994-09-01), Collins et al.

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