Electrostatic chuck with mechanism for lifting up the peripheral

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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156345, 118723R, 279128, H02N 1300

Patent

active

056778244

ABSTRACT:
An electrostatic chuck applicable to, e.g., an epitaxial apparatus or an etching apparatus for electrostatically chucking a semiconductor substrate or wafer is disclosed. The chuck includes a stage for electrostatically retaining the wafer thereon. A plurality of lift pins are elevatable to thrust up the wafer. A plurality of release pins are arranged on the stage for thrusting up the peripheral portion of the wafer. A plurality of drive mechanisms respectively thrust up the release pins stepwise within the allowable elastic deformation range of the wafer. A control device selectively actuates the release pins via the associated drive mechanisms.

REFERENCES:
patent: 5179498 (1993-01-01), Hongoh et al.
patent: 5569350 (1996-10-01), Osada et al.
patent: 5591269 (1997-01-01), Arami et al.

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