Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1992-03-02
1994-06-28
Pellinen, A. D.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
361230, 361233, 361235, H02N 1300
Patent
active
053252616
ABSTRACT:
The present invention relates in particular to electrostatic holding devices for holding semiconductor wafers and other materials during processing operations, such as vacuum sputtering, for example.
One problem with such holding devices is that a residual electrostatic charge tends to build up on the surface of the device. This can lead to problems in the release of the wafer when processing is completed, as this electrostatic charge will tend to grip the wafer.
The present invention overcomes this problem by determining a value of drive voltage to be applied to the electrostatic chuck to cancel out the holding effects of at least most of the residual electrostatic charge and thus enable release of the wafer. The value of drive voltage to be applied to allow release is determined by monitoring motion of the wafer as the drive voltage is varied, the motion of the wafer being indicative of whether it is being gripped by the body or not.
REFERENCES:
patent: 3197682 (1965-07-01), Klass
patent: 3634740 (1972-01-01), Stevko
patent: 3916270 (1975-10-01), Wachtler et al.
patent: 3983401 (1976-09-01), Livesay
patent: 4184188 (1980-01-01), Briglia
patent: 4384918 (1983-05-01), Abe
patent: 4412133 (1983-10-01), Eckes et al.
patent: 4480284 (1984-10-01), Tojo et al.
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4520421 (1985-05-01), Sakitani et al.
patent: 4551192 (1985-11-01), DiMilia et al.
patent: 4554611 (1985-11-01), Lewin
patent: 5117121 (1992-05-01), Watanabe et al.
Krishnan Aditya
Pellinen A. D.
Unisearch Limited
LandOfFree
Electrostatic chuck with improved release does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck with improved release, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck with improved release will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2381245