Electrostatic chuck structure for semiconductor...

Details Electrostatic chuck structure for semiconductor... Electrostatic chuck structure for semiconductor...

2008-05-16

2009-08-25

Fleming, Fritz M (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C361S230000, C361S231000, C361S232000, C361S233000, C279S128000

Reexamination Certificate

active

07580238

ABSTRACT:
An electrostatic chuck structure according to example embodiments of the present invention may include at least one specific region of a conductor having a thickness relatively smaller than those of other regions, at least one specific region of a dielectric having a thickness relatively larger than those of other regions, or at least one specific region of a conductor having a thickness relatively smaller than those of other regions and at least one specific region of a dielectric having a thickness relatively larger than those of other regions. Therefore, etching rate and CD uniformity can be improved during a semiconductor manufacturing process.

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patent: 5777838 (1998-07-01), Tamagawa et al.
patent: 6608745 (2003-08-01), Tsuruta et al.
patent: 6992876 (2006-01-01), Nakajima et al.
patent: 0142055 (1998-07-01), None
patent: 1020030008724 (2003-01-01), None

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