Electrostatic chuck including a heater mechanism

Details Electrostatic chuck including a heater mechanism Electrostatic chuck including a heater mechanism

2004-11-10

2008-07-08

Leja, Ronald W (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

Reexamination Certificate

active

07397648

ABSTRACT:
An electrostatic chuck comprises a main body with a mounting surface and an opposed surface facing away from the mounting surface. At least one chucking electrode extends along the mounting surface of the main body and a first heater layer extends along the opposed surface of the main body. The electrostatic chuck can be used to heat and electrostatic ally attract a work piece, such as a wafer, to a work piece support surface during various processing techniques.

REFERENCES:
patent: 5566043 (1996-10-01), Kawada et al.
patent: 5693581 (1997-12-01), Honma et al.
patent: 5796074 (1998-08-01), Edelstein et al.
patent: 6239402 (2001-05-01), Araki et al.
patent: 2004/0173161 (2004-09-01), Mariner et al.
patent: 07-307377 (1995-11-01), None

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