Electrostatic chuck for substrate stage, electrode used for...

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

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C198S619000

Reexamination Certificate

active

07916447

ABSTRACT:
An electrostatic chuck is provided for a substrate stage that can be used in plasma treatment of various substrates such as a large-sized glass substrate for a flat panel display (FPD), a semiconductor wafer or the like. The electrostatic chuck is divided into a plurality of electrodes formed into nearly bar-like shapes. In accordance with an exemplary embodiment, each of the divided bar-like electrodes includes an inner electrode and a single layer thermally sprayed film formed on the surface of the inner electrode, with the bar-like electrodes disposed in parallel so as to form a plane electrode.

REFERENCES:
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patent: 5315473 (1994-05-01), Collins et al.
patent: 5978202 (1999-11-01), Wadensweiler et al.
patent: 6490145 (2002-12-01), Kholodenko et al.
patent: 6608745 (2003-08-01), Tsuruta et al.
patent: 6781669 (2004-08-01), Tanaka
patent: 2003/0044653 (2003-03-01), Hiramatsu et al.
patent: 62211363 (1987-09-01), None
Merriam-Webster's Collegiate Dictionary, 1999, Merriam-Webster, 10th, 278.

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