Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2011-08-09
2011-08-09
Barr, Michael (Department: 1714)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C216S058000, C216S067000
Reexamination Certificate
active
07993465
ABSTRACT:
Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.
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Foad Majeed
Jennings Dean C.
Simmons Jonathon
Applied Materials Inc.
Barr Michael
Blankman Jeffrey I.
Campbell Natasha
Diehl Servilla LLC
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