Electrostatic chuck and method of forming

Details Electrostatic chuck and method of forming Electrostatic chuck and method of forming

2011-07-19

2011-07-19

Jackson, Stephen W (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C279S128000

Reexamination Certificate

active

07983017

ABSTRACT:
A Coulombic electrostatic chuck is disclosed which includes a substrate, a conductive layer overlying the substrate, and an arc elimination layer overlying the conductive layer. The electrostatic chuck further includes a high-k dielectric layer overlying the arc elimination layer, wherein the high-k dielectric layer has a dielectric constant of not less than about 10 and a resistivity of not less than about 1011Ohm-cm.

REFERENCES:
patent: 4692836 (1987-09-01), Suzuki
patent: 5151845 (1992-09-01), Watanabe et al.
patent: 5166856 (1992-11-01), Liporace et al.
patent: 5191506 (1993-03-01), Logan et al.
patent: 5324053 (1994-06-01), Kubota et al.
patent: 5384682 (1995-01-01), Watanabe et al.
patent: 5463526 (1995-10-01), Mundt
patent: 5522131 (1996-06-01), Steger
patent: 5560780 (1996-10-01), Wu et al.
patent: 5583736 (1996-12-01), Anderson et al.
patent: 5708557 (1998-01-01), Feigenbaum et al.
patent: 5737178 (1998-04-01), Herchen
patent: 5751537 (1998-05-01), Kumar et al.
patent: 5838529 (1998-11-01), Shufflebotham et al.
patent: 5886865 (1999-03-01), Parkhe et al.
patent: 5909355 (1999-06-01), Parkhe
patent: 5986875 (1999-11-01), Donde et al.
patent: 6055150 (2000-04-01), Clinton et al.
patent: 6215641 (2001-04-01), Busse et al.
patent: 6272002 (2001-08-01), Mogi et al.
patent: 6351367 (2002-02-01), Mogi et al.
patent: 6522519 (2003-02-01), Hirayanagi
patent: 6606234 (2003-08-01), Divakar
patent: 6678143 (2004-01-01), Masuda et al.
patent: 6731496 (2004-05-01), Hiramatsu et al.
patent: 6768627 (2004-07-01), Kitabayashi et al.
patent: 6771483 (2004-08-01), Harada et al.
patent: 6798488 (2004-09-01), Murata et al.
patent: 6982125 (2006-01-01), LaCourse et al.
patent: 6992876 (2006-01-01), Nakajima et al.
patent: 7042697 (2006-05-01), Tsuruta et al.
patent: 2001/0016410 (2001-08-01), Cheng et al.
patent: 2001/0046112 (2001-11-01), Herchen
patent: 2002/0135967 (2002-09-01), Fuwa et al.
patent: 2002/0167779 (2002-11-01), Carroll et al.
patent: 2003/0010292 (2003-01-01), Kholodenko et al.
patent: 2003/0047283 (2003-03-01), Parkhe et al.
patent: 2003/0087483 (2003-05-01), Iijima et al.
patent: 2005/0152089 (2005-07-01), Matsuda et al.
patent: 2006/0043067 (2006-03-01), Kadkhodayan et al.
patent: 2006/0096946 (2006-05-01), Schaepkens et al.
patent: 2006/0158823 (2006-07-01), Mizuno et al.
patent: 2008/0100984 (2008-05-01), LaFontaine et al.
patent: 0498752 (1992-08-01), None
patent: 0506537 (1992-09-01), None
patent: 0805487 (1997-11-01), None
patent: 0948042 (1999-10-01), None
patent: 1220311 (2002-07-01), None
patent: 08019982 (1996-01-01), None
patent: 11163112 (1999-06-01), None
patent: 2005317727 (2005-11-01), None
patent: 95/20838 (1995-08-01), None
patent: 9847176 (1998-10-01), None
patent: 9916122 (1999-04-01), None
patent: 20081051369 (2008-05-01), None
Smith et al., Electrical Conduction in Polyimide between 20 and 350 Celcius degree, May 1986, Massachusetts Institute of Technology, 93-106.
http://en.wikipedia.org/wiki/Polyimide, Sep. 2004.
Azom, Boron Nitride, Feb. 2001, Azom, www.azom.com/details.asp?articleid=78.
Fitch, C.J., “Development of the Electrostatic Clutch,” IBM Journal, Jan. 1957, pp. 49-56.
Integrated Publishing, Dielectric Constants of Material, 2003, http://www.tpub.com/content
eets/14193/css/14193—138.htm.
Lutz et al., “Influence of Absorbed Water on Volume Resistivity of Epoxy Resin Insulators”, 2010 International Conference on Solid Dielectrics, Potsdam, Germany, 2010, pp. 1-4.
Microwaves101.com, “Gallium Arsenide”, 2007, http://www.microwaves101.com/encyclopedia/galliumarsenide.cfm.
Accuratus.com, “Silicon Carbide, SiC”, 2002, http://accuratus.com/silicar.html.
Zykov et al., “Electrical and Optical Properties of Gallium Phosphide Films”, 1970, Consults Bureau, http://resources.metapress.com/pdf-preview.axd?code=v707558021844310&size=largest, p. 761.

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