Electrostatic chuck and method for manufacturing the same

Details Electrostatic chuck and method for manufacturing the same Electrostatic chuck and method for manufacturing the same

2011-05-24

2011-05-24

Patel, Dharti H (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C361S235000, C279S128000

Reexamination Certificate

active

07948735

ABSTRACT:
The electrostatic chuck includes a base including an aluminum nitride-containing member; a dielectric layer formed on the base including a member having a volume resistivity of at least 1×1015Ω·cm at a temperature range of about 25° C. to about 300° C. and including 2 to 5% by mass of yttrium oxide, 2 to 5% by mass of ytterbium oxide, and a balance of aluminum nitride based on the total mass of the dielectric layer; and an electrode embedded under the dielectric layer so as to be positioned between the dielectric layer and the base, configured to generate an electrostatic absorption force.

REFERENCES:
patent: 6693789 (2004-02-01), Inazumachi et al.
patent: 2005/0016986 (2005-01-01), Ito
patent: 2006/0213900 (2006-09-01), Matsuda et al.
patent: 2008/0062610 (2008-03-01), Himori et al.
patent: 09-283607 (1997-10-01), None
patent: 10189698 (1998-07-01), None
patent: 2006-269826 (2006-10-01), None

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