Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2004-12-02
2010-02-16
Nguyen, Danny (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
C361S230000
Reexamination Certificate
active
07663860
ABSTRACT:
An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.
REFERENCES:
patent: 5777838 (1998-07-01), Tamagawa et al.
patent: 5810933 (1998-09-01), Mountsier et al.
patent: 6028762 (2000-02-01), Kamitani
patent: 6077357 (2000-06-01), Rossman et al.
patent: 6117246 (2000-09-01), Parkhe et al.
patent: 6261708 (2001-07-01), Ohashi et al.
patent: 6320736 (2001-11-01), Shamouilian et al.
patent: 6556414 (2003-04-01), Kosakai
patent: 6946403 (2005-09-01), Kellerman et al.
patent: 6960743 (2005-11-01), Hiramatsu et al.
patent: 2002/0067585 (2002-06-01), Fujiwara
patent: 2004/0040665 (2004-03-01), Mizuno et al.
patent: 2004/0055709 (2004-03-01), Boyd et al.
patent: 2004/0060925 (2004-04-01), Zhou et al.
patent: 5-6933 (1993-01-01), None
patent: 7-153825 (1995-06-01), None
patent: 9-172055 (1997-06-01), None
patent: 9-283607 (1997-10-01), None
patent: 10-284360 (1998-10-01), None
patent: 2000-277594 (2000-10-01), None
patent: 2000-332091 (2000-11-01), None
patent: 2001-308075 (2001-11-01), None
patent: 2001-351966 (2004-12-01), None
patent: WO 99/16122 (1999-04-01), None
Kimura Hidetoshi
Nakayama Hiroyuki
Nishimoto Shinya
Nguyen Danny
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
LandOfFree
Electrostatic chuck does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4178819