Electrostatic chuck

Details Electrostatic chuck Electrostatic chuck

2006-09-05

2006-09-05

Sircus, Brian (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C361S233000, C156S915000, C156S345510, C156S345430, C118S500000, C118S715000, C118S730000

Reexamination Certificate

active

07102872

ABSTRACT:
An ESC (Electrostatic Chuck) to chuck an object by electrostatic force, having an ESC main body supporting the object; a guide ring supported by the ESC main body and encircling the object; a dielectric material layer interposed between the guide ring and the ESC main body; a media gas supplier to supply a media gas to the guide ring; and a power supplier to supply power to the ESC main body. With this configuration, the ESC provides an apparatus to chuck a guide ring to an ESC main body, while maintaining the guide ring and an object, such as a wafer, at the same or similar temperature, thereby enhancing uniformity of the object during a semiconductor manufacturing process such as etching, deposition, or the like.

REFERENCES:
patent: 5612851 (1997-03-01), Barnes et al.
patent: 6733624 (2004-05-01), Koshiishi et al.
patent: 2003/0106647 (2003-06-01), Koshiishi et al.
patent: 2000-36490 (2000-02-01), None
patent: 2002-223366 (2002-08-01), None
patent: 2001-46528 (2001-06-01), None
patent: 10-303076 (2001-07-01), None
patent: 10-313028 (2001-10-01), None

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