Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1996-05-17
1998-05-19
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
057543917
ABSTRACT:
An electrostatic wafer-holding chuck includes first and second dielectric plates formed of single crystal aluminum oxide and at least one electrode disposed within a recess formed in the first dielectric plate. The second dielectric plate has a top wafer-supporting surface that has a fluid distribution network formed therein. The fluid distribution network channels a heat transfer medium to the backside of the wafer. When the first and second dielectric plates are assembled, the first dielectric plate is disposed contiguous to the second dielectric plate and then are diffusively joined together to form a monolithic, hermetically-sealed electrostatic chuck.
REFERENCES:
patent: 3591348 (1971-07-01), La Belle, Jr.
patent: 3687633 (1972-08-01), La Belle, Jr. et al.
patent: 3953174 (1976-04-01), La Belle, Jr.
patent: 5103367 (1992-04-01), Horwitz et al.
patent: 5271274 (1993-12-01), Khuri-Yakub et al.
patent: 5413360 (1995-05-01), Atari et al.
patent: 5426558 (1995-06-01), Sherman
patent: 5436790 (1995-07-01), Blake et al.
patent: 5445709 (1995-08-01), Kojima et al.
patent: 5452177 (1995-09-01), Frutiger
patent: 5452510 (1995-09-01), Barnes et al.
patent: 5535090 (1996-07-01), Sherman
patent: 5600530 (1997-02-01), Smith
Semiconductor International "Electrostatic Chucks in Wafer Processing", (a Cahners Publication, Peter Singer, Senior Editor) Apr. 1995.
Fleming Fritz
Saphikon Inc.
LandOfFree
Electrostatic chuck does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrostatic chuck, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic chuck will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1858855