Electrostatic apparatus and method for removing particles from s

Details Electrostatic apparatus and method for removing particles from s Electrostatic apparatus and method for removing particles from s

1993-06-17

1994-09-27

Chaudhuri, Olik

Metal working

Barrier layer or semiconductor device making

437210, 437925, 15 151, H01L 2130

Patent

active

053504283

ABSTRACT:
Disclosed herein is an apparatus and method for cleaning the edges of semiconductor wafers by using a particle removing means having an electrostatically charged material. The particles are collected and disposed of so that they do not come in contact again with the clean semiconductor wafers.

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"IBM TDB" vol. 18, No. 5, Oct. 1975, K. S. Sachar.

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