Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1992-11-12
1994-02-15
Martin, Roland
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 59, 430 72, 430 73, 430 75, 430 76, 430 77, 430 78, 430 79, 430900, 355211, G03G 506, G03G 5047, G03G 1522
Patent
active
052865894
ABSTRACT:
An electrophotographic photosensitive member has a photosensitive layer on an electroconductive support. The photosensitive layer comprises a compound having a structure represented by the general formula (1) or (2) as a charge-generating material: ##STR1## wherein A.sub.1 and A.sub.3 are respectively an alkyl radical, an aralkyl radical, an aromatic radical or a heterocyclic radical which may have a substituent; A.sub.2 is hydrogen atom, or an alkyl radical, an aralkyl radical, an aromatic radical, or a heterocyclic radical which may have a substituent; A.sub.1 and A.sub.2 may be the same with or different from each other; A.sub.1 and A.sub.2 may be linked together to form a ring; and n is an integer of 1, 2, or 3.
REFERENCES:
patent: 3041165 (1962-06-01), Sus et al.
patent: 4448868 (1984-05-01), Suzuki et al.
patent: 4465753 (1984-08-01), Tanaka et al.
patent: 4529678 (1985-07-01), Ohta
patent: 4666809 (1987-05-01), Matsumoto et al.
patent: 4798777 (1989-01-01), Takiguchi et al.
patent: 4931371 (1990-06-01), Matsumoto et al.
Go Shintetsu
Iuchi Kazushi
Matsumoto Masakazu
Miyaji Toshie
Miyazaki Hajime
Canon Kabushiki Kaisha
Martin Roland
LandOfFree
Electrophotographic photosensitive member does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrophotographic photosensitive member, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrophotographic photosensitive member will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1205894