Electrophoretic method for applying photoresist to three dimensi

Details Electrophoretic method for applying photoresist to three dimensi Electrophoretic method for applying photoresist to three dimensi

1989-07-10

1991-04-02

Welsh, David

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430319, 2041811, 427 98, G03C 168, G03C 500

Patent

active

050046721

ABSTRACT:
A process for manufacturing a 3-dimensional circuit board by electrophoretic deposition whereby (a) providing the board with a conductive surface and (b) applying a photoresist by electrophoretic deposition.

REFERENCES:
patent: 4238385 (1980-12-01), Okado et al.
patent: 4592816 (1986-06-01), Emmons et al.
patent: 4671854 (1987-06-01), Ishikawa et al.
patent: 4751172 (1988-06-01), Rodriguez

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