Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate
2011-06-28
2011-06-28
Thai, Luan C (Department: 2891)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having schottky gate
C438S047000, C438S172000
Reexamination Certificate
active
07968390
ABSTRACT:
In one embodiment, the disclosure relates to an electronic device successively comprising from its base to its surface: (a) a support layer, (b) a channel layer adapted to contain an electron gas, (c) a barrier layer and (d) at least one ohmic contact electrode formed by a superposition of metallic layers, a first layer of which is in contact with the barrier layer. The device is remarkable in that the barrier layer includes a contact region under the ohmic contact electrode(s). The contact region includes at least one metal selected from the metals forming the superposition of metallic layers. Furthermore, a local alloying binds the contact region and the first layer of the electrode(s).
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Edwards Angell Palmer & & Dodge LLP
S.O.I.Tec Silicon on Insulator Technologies
Thai Luan C
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