Electronic component and display device and a method of...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

Reexamination Certificate

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C430S033000, C257SE21023

Reexamination Certificate

active

07972949

ABSTRACT:
An electronic component or display device of the present invention can be provided by using a following pattern formation method. On a substrate treated with a first etching with a first resist pattern as a first mask, a second resist pattern is transfer-printed on the first resist patterns so as to partially overlap with the first resist pattern and partially extended from the first resist pattern. And then a second etching is performed by using the first resist pattern and the second resist pattern as a second mask. The first resist pattern and the second resist pattern are used for forming wirings and/or terminals, and the extended portion of the second resist pattern is used to make the wirings to have a cross section of a stair-like edge shape.

REFERENCES:
patent: 7148090 (2006-12-01), Chapman
patent: 2000-131719 (2000-05-01), None
patent: 3236266 (2001-09-01), None
patent: 3415602 (2003-04-01), None
patent: 3616584 (2004-11-01), None
patent: 2005-159294 (2005-06-01), None
patent: 3730002 (2005-10-01), None
patent: 3756363 (2006-01-01), None
patent: 2006-512757 (2006-04-01), None
patent: 2006-124546 (2006-05-01), None

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