Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type
Reexamination Certificate
2010-01-11
2011-11-15
Souw, Bernard E (Department: 2881)
Radiant energy
Inspection of solids or liquids by charged particles
Electron microscope type
C250S310000
Reexamination Certificate
active
08058614
ABSTRACT:
The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron to microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. The disclosure also relates to an electron microscope and a processing system which are adapted for performing the method.
REFERENCES:
patent: 4500790 (1985-02-01), Bretscher et al.
patent: 4933552 (1990-06-01), Lee
patent: 5616921 (1997-04-01), Talbot et al.
patent: 6038015 (2000-03-01), Kawata
patent: 6590210 (2003-07-01), Essers
patent: 6843927 (2005-01-01), Naser-Ghodsi
patent: 7425701 (2008-09-01), Steigerwald et al.
patent: 7435973 (2008-10-01), Koops et al.
patent: 7645989 (2010-01-01), Bihr et al.
patent: 7654989 (2010-02-01), Knapp
patent: 7818290 (2010-10-01), Davis et al.
patent: 2004/0169146 (2004-09-01), Maydanich et al.
patent: 2004/0245465 (2004-12-01), Steigerwald et al.
patent: 2005/0103272 (2005-05-01), Koops et al.
patent: 2005/0230621 (2005-10-01), Edinger et al.
patent: 2006/0113474 (2006-06-01), Todokoro
patent: 2006/0284090 (2006-12-01), Koops et al.
patent: 2006/0284115 (2006-12-01), Kaneoka et al.
patent: 2007/0158588 (2007-07-01), Zhou et al.
patent: 2008/0029699 (2008-02-01), Kaneoka et al.
patent: 2008/0099674 (2008-05-01), Bihr et al.
patent: 2009/0121132 (2009-05-01), Koops et al.
patent: 44 21 517 (1995-01-01), None
patent: 198 45 329 (1999-09-01), None
patent: 102 08 043 (2003-09-01), None
patent: 103 01 579 (2004-07-01), None
patent: 0 444 085 (1999-03-01), None
patent: 1 439 565 (2004-07-01), None
patent: 1 587 128 (2005-10-01), None
patent: 2004021023 (2004-03-01), None
patent: WO 2005/036583 (2005-04-01), None
patent: WO 2005/101451 (2005-10-01), None
H. Koops et al, “High-resolution electron-beam induced deposition,” J. Vac. Sci. Technol. B 6(1), Jan./Feb. 1988, pp. 477-481.
European Search Report dated Nov. 26, 2010 in the counterpart European patent application 07018076.5-2208.
Bihr Johannes
Budach Michael
Clauss Tobias
Panteleit Friedhelm
Carl Zeiss NTS GmbH
Riter Bruce D
Souw Bernard E
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