Electron-gun evaporation system having evaporation-source stream

Details Electron-gun evaporation system having evaporation-source stream Electron-gun evaporation system having evaporation-source stream

1995-08-29

1998-07-28

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723VE, 118723CB, 118728, 118730, C23C 1600, C23C 1430

Patent

active

057857636

ABSTRACT:
A collimator is provided in an evaporation chamber to prevent the stray electrons from reaching a semiconductor substrate on which a film of the source is deposited. The collimator has a wall that prevent the stray electrons from reaching the evaporation object and a window that allows the gaseous evaporation source to travel to the object. The problem caused by the stray electrons can be solved with a simple structure, realizing a better evaporation process on the substrate.

REFERENCES:
patent: 3467057 (1969-09-01), Tamura
patent: 4303694 (1981-12-01), Bois
patent: 4448802 (1984-05-01), Buhl
patent: 5403400 (1995-04-01), Nishiguchi
patent: 5601652 (1997-02-01), Mullin

Affiliated with

Also associated with

Rating

Electron-gun evaporation system having evaporation-source stream does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron-gun evaporation system having evaporation-source stream, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron-gun evaporation system having evaporation-source stream will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-19570