Electron cyclotron resonance plasma source and method of operati

Details Electron cyclotron resonance plasma source and method of operati Electron cyclotron resonance plasma source and method of operati

1993-04-16

1994-12-06

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156345, 118723MA, 427571, 427575, H05H 100

Patent

active

053707656

ABSTRACT:
A method and apparatus are disclosed employing electron cyclotron resonant (ECR) heating to produce plasma for applications including but not limited to chemical vapor deposition and etching. A magnetic field is formed by magnets circumferentially arranged about a cylindrical and symmetrical chamber with microwave power injected perpendicularly to a longitudinal axis of the chamber for preventing line-of-sight communication of resulting energetic electrons with a specimen being treated. The microwave power is distributed uniformly around the circumference of the chamber by applicators formed by one or more pairs of annular sectors, each of which comprises a slotted wave guide antenna, and coupled to an external source of microwave power by a hybrid coupler. A magnetic field free region produces uniformity of plasma distribution in a plasma stream approaching the outlet. The above characteristics are maintained for the plasma stream over substantial transverse dimensions larger than the specimen. A rectilinear applicator array is also disclosed for selected applications.

REFERENCES:
patent: 4745337 (1988-05-01), Pichot et al.
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 5133826 (1992-07-01), Dandl

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