Electron beam writing equipment using plural beams and method

Details Electron beam writing equipment using plural beams and method Electron beam writing equipment using plural beams and method

2006-03-21

2006-03-21

Lee, John R. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S310000, C250S311000

Reexamination Certificate

active

07015482

ABSTRACT:
An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.

REFERENCES:
patent: 6137113 (2000-10-01), Muraki
patent: 6593152 (2003-07-01), Nakasuji et al.
patent: 6624430 (2003-09-01), Higuchi
patent: 6710361 (2004-03-01), Pfeiffer et al.
patent: 9-245708 (1997-09-01), None
patent: 10-64812 (1998-03-01), None

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