Electron beam writing equipment and electron beam writing...

Details Electron beam writing equipment and electron beam writing... Electron beam writing equipment and electron beam writing...

2006-08-29

2006-08-29

Berman, Jack I. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S492220, C250S492230

Reexamination Certificate

active

07098464

ABSTRACT:
The present invention provides a writing technique which can perform high-accuracy overlay writing in electron beam writing equipment performing mark detection by light.Electron beam writing equipment has an electron source; an electron optical system illuminating an electron beam emitted from the electron source onto a sample for scanning to form a desired pattern on the sample; a stage mounting the sample; a mark substrate provided on the stage; means beaming a light beam for position detection which is on the same side as the illumination direction of the electron beam for illuminating the mark substrate; light detection means which is on the same side as the means beaming a light beam for detecting reflected light reflected on the mark substrate; and electron detection means which is on the side opposite the light detection means with respect to the mark substrate for detecting a transmitted electron obtained by illumination of the electron beam onto the mark substrate, wherein relative position information of the light beam and the electron beam is obtained based on the signals of the detected reflected light and transmitted electron.

REFERENCES:
patent: 5168166 (1992-12-01), Hayakawa et al.
patent: 6762421 (2004-07-01), Nakasugi
patent: 2006/0108541 (2006-05-01), Koike
patent: 1-214117 (1988-02-01), None
patent: 6-275500 (1993-03-01), None
patent: 9-22676 (1995-07-01), None

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