Electron-beam writing device and electron-beam writing method

Details Electron-beam writing device and electron-beam writing method Electron-beam writing device and electron-beam writing method

2006-01-24

2006-01-24

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S306000, C250S307000, C250S3960ML, C219S121120, C365S199000

Reexamination Certificate

active

06989536

ABSTRACT:
The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means311calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means312calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter306(S503). Count conversion means605separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means314calculates an extinction ratio to determine the extinction ratio at a variable attenuator307(S505). ATT D/A converter303specifies the extinction ratio at the attenuator307to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter306so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.

REFERENCES:
patent: 5838119 (1998-11-01), Engle
patent: 2002/0170887 (2002-11-01), Furuta et al.
patent: 08-273583 (1996-10-01), None

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