Electron beam writing apparatus and writing method

Details Electron beam writing apparatus and writing method Electron beam writing apparatus and writing method

2006-07-03

2009-02-03

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S492210, C250S492230, C250S492300, C250S3960ML, C250S398000, C430S030000, C430S296000

Reexamination Certificate

active

07485879

ABSTRACT:
A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of the pattern to be written; and a writing unit configured to create an electron beam with the current density selected by said selector unit, shape the created electron beam into a shot size less than or equal to said maximal shot size in units of the shots, and shoot the shaped electron beam onto a workpiece to thereby write said pattern.

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