Electron beam writing apparatus and method

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

Reexamination Certificate

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Details

C250S492100, C250S492200, C250S491100

Reexamination Certificate

active

08067753

ABSTRACT:
A Z stage is placed on an XY stage in avoidance of an area to which a mark table is fixed. The mask M is placed on a holding mechanism provided on the Z stage. A middle value of the range adjustable by the focal adjustment mechanism is made coincident with the height of the mark table. The height of the mark table is measured and the heights of plural measurement points of the mask M are measured. The Z stage is moved in such a manner that the height of a middle value between highest and lowest values of the heights of these measurement points coincides with the height of the mark table.

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Office Action issued Jan. 10, 2011, in Chinese Patent Application No. 200910209041.0 (with English translation).
Office Action issued Jan. 25, 2011, in Korean Patent Application No. 10-2009-24696 (with English translation).

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