Electron-beam treatment procedure for patterned mask layers

Details Electron-beam treatment procedure for patterned mask layers Electron-beam treatment procedure for patterned mask layers

1996-05-16

1997-08-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430311, 2504923, G03F 900

Patent

active

056609574

ABSTRACT:
Methods for pretreating patterned masks layers, such as photoresist masks, with electron-beam radiation for use in high temperature processes are disclosed. The electron-beam exposure deactivates compounds within the mask material which would ordinarily decompose and produce gasses within the photoresist layer. The gasses cause blistering in the untreated photoresist layer, which in turn degrades the dimensional integrity of the untreated layer.

REFERENCES:
patent: 3627599 (1971-12-01), Goldmacher et al.
patent: 4090936 (1978-05-01), Barton
patent: 4264711 (1981-04-01), Greeneich
patent: 4312935 (1982-01-01), Engler et al.
patent: 4339526 (1982-07-01), Baise et al.
patent: 4410611 (1983-10-01), MacIver
patent: 4474869 (1984-10-01), Brault et al.
patent: 4702993 (1987-10-01), White et al.
patent: 4876177 (1989-10-01), Akahoshi et al.
patent: 4968552 (1990-11-01), Linde
patent: 5024918 (1991-06-01), Porter et al.
patent: 5064748 (1991-11-01), Bobbio
patent: 5153103 (1992-10-01), Kotachi et al.
patent: 5252430 (1993-10-01), Hashimoto et al.
W.R.. Livesay, "A New Compact Electron Beam Curing System," Radtech 1990--North American Conference, Chicago, IL, Mar. 25-29, 1990, pp. 1-6.
W.R. Livesay, "Large Area Electron Beam Source," Electron Vision Corporation, San Diego, CA, Jun. 1-4, 1993, pp. 1-9.
W.R. Livesay, et al., "Electron Beam Hardening of Photoresist," SPIE Microlithography 1993 Conference, 1993.
W.R. Livesay, "Vertical Lithography--Controlling Resist Profiles in Optical Lithography With a Large Area Electron Beam," SPIE vol. 2194, pp. 355-365, Jan. 1994.
Matthew Ross, "Chemical Analysis of Electron Beam Curing of Positive Photoresist," SPIE vol. 2195, pp. 834-848, May, 1994.

Affiliated with

Also associated with

Rating

Electron-beam treatment procedure for patterned mask layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron-beam treatment procedure for patterned mask layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron-beam treatment procedure for patterned mask layers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1987235