Electroplating method for producing porous tantalum capacitor el

Details Electroplating method for producing porous tantalum capacitor el Electroplating method for producing porous tantalum capacitor el

1982-09-27

1984-12-18

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

204 38A, 204 39, 204 64T, C25D 502, C25D 366, C25C 326

Patent

active

044889410

ABSTRACT:
A tantalum wire is coated along part of its length with a high-surface-area electro deposit of tantalum from a molten K-salt. This process is relatively very simple and produces an openly porous tantalum sponge having exceptionally high purity for use as an anode in a tantalum capacitor.

REFERENCES:
patent: 1933319 (1933-10-01), Driggs et al.
patent: 2786809 (1957-03-01), Raynes
patent: 3239436 (1966-03-01), Hagiwara et al.
patent: 4148131 (1979-04-01), Nishino et al.
patent: 4450049 (1984-05-01), Nakata et al.
Senderoff et al., Coherent Coatings of Refractory Metals, Reprint from Science, Sep. 23, 1966, vol. 153, No. 3743, pp. 1475-1481, pp. 1-7.
Walker et al., Production of Metal Powders by Electrodeposition, Chemistry and Industry (London), Oct. 6, 1979, pp. 642-647.
Cohen, High Rate Electrodeposition of Niobium from Molten Fluorides Using Periodic Reversal Steps on Grain Size, J. Electrochem. Soc., vol. 128, No. 4, Apr. 1981, pp. 731-740.

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