Electron beam system with reduced charge buildup

Details Electron beam system with reduced charge buildup Electron beam system with reduced charge buildup

1981-12-31

1984-06-05

Howell, Janice A.

Radiant energy

Inspection of solids or liquids by charged particles

Methods

2504923, C08J 710

Patent

active

044530862

ABSTRACT:
In electron beam testing systems wherein high energy, high resolution electron beams are used to test lithographic masks, a technique and apparatus are described for discharging electrons which are left on the surface of the mask, and which alter the input trajectory of the electron beam. The materials used in these masks are such that induced photoconductivity and photoemissivity are extremely low and are incapable of providing sufficient electron discharge. A thin, low work function coating is applied over the entire mask surface, the coating being transparent to the radiation which will later be incident upon the mask when it is used in a fabrication process. Due to induced photoemission in the thin coating layer, enough photoemitted electrons will be produced to balance the buildup of electrons from the electron beam, thereby discharging the surface of the mask. The electron beam is a high energy beam, having energies greater than about 5000 eV, and a resolution less than about 1 micrometer.

REFERENCES:
patent: 2064369 (1936-12-01), Biggs
patent: 3376469 (1968-04-01), Consoli
patent: 3507709 (1970-04-01), Bower
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4041300 (1977-08-01), Blount
patent: 4076558 (1978-02-01), Rupprecht et al.
patent: 4152601 (1979-05-01), Kadota et al.
Grobman, W. D., and Koch, E. E., "Photoemission from Organic Molecular Crystals." In: Ley, L. and Cardona, M., Photoemission in Solids II, (Topics in Applied Physics), vol. 27, Berlin, Heidelberg, N.Y., Springer-Verlag, 1979, pp. 261-263.

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