Electron beam sensitive positive resist comprising the polymeriz

Details Electron beam sensitive positive resist comprising the polymeriz Electron beam sensitive positive resist comprising the polymeriz

1985-10-28

1987-04-14

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430942, 430326, 430311, 430331, 528 30, 528 32, G03C 1495, G03C 516

Patent

active

046578412

ABSTRACT:
Poly(alkenyltrialkylsilane sulfone)s have been found to be electron beam sensitive and suitable for use as positive resists in a two layer resist system. The described resists are prepared by the polymerization of an .omega.-alkenyltrimethylsilane with sulfur dioxide with or without a second solubilizing olefinic compound. The resultant composition evidences high sensitivity, excellent resolution characteristics and excellent resistance to oxygen reactive-ion etching.

REFERENCES:
patent: 3223686 (1965-12-01), Natta et al.
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 4396702 (1983-08-01), Desai et al.
Julius Grant, ed, Hackh's Chemical Dictionary [American and British Usage], Third Edition, McGraw-Hill Book Company, Inc., New York, N.Y., 1944, p. 17.

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