Electron beam sensitive mixture resist

Details Electron beam sensitive mixture resist Electron beam sensitive mixture resist

1983-03-31

1984-05-15

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430287, 430270, 430942, 20415915, 525256, 525259, G03C 516

Patent

active

044488750

ABSTRACT:
This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of the mixture of the half-ester or half amide product of reaction of an N-hydroxy or N-aminoalkyl amide with an alkylvinyl ether-maleic anhydride copolymer and the products of reaction of a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by mixing the product of reaction of hydroxyethyl pyrrolidone and octadecylvinyl ether--maleic anhydride copolymer with the products of reaction of the mixture of hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

REFERENCES:
patent: 3703402 (1972-11-01), Cole
patent: 3931435 (1976-01-01), Gipstein et al.
patent: 4061832 (1977-12-01), Roberts
patent: 4375398 (1983-03-01), Lorenz et al.
Herbert Cole et al., "Electron Sensitive Resists Derived from Vinylether-Maleic Anhydride Copolymers", IEEE Transactions on Electron Devices, vol. ED-22, No. 7, 1975, pp. 417-420.

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