Electron beam pattern transfer device and method for aligning ma

Details Electron beam pattern transfer device and method for aligning ma Electron beam pattern transfer device and method for aligning ma

1982-05-04

1984-09-04

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 3700

Patent

active

044699492

ABSTRACT:
According to the invention an electron beam pattern transfer device with an improved alignment means is provided.
A first and a second mark M.sub.1, M.sub.2 for alignment purposes are formed on the surface of the wafer and the wafer holder, respectively. The first mark M.sub.1 is formed on the wafer by conventional lithographic technique and the second mark M.sub.2 consists of a hole or a heavy metal, such as Ta or Ta.sub.2 O.sub.5. A third alignment mark M.sub.3 is provided on the photocathode mask having a position corresponding to M.sub.2 on the wafer holder and spaced a known distance L.sub.2 from an imaginary reference position M.sub.4 on the mask. The first step of the alignment process requires the detection of a relative distance L.sub.1 between the first and second marks M.sub.1, M.sub.2 by conventional detecting means, such as an optical measuring means. In the next step, the relative position of the photocathode mask and the wafer holder is adjusted so that the distance between the marks M.sub.2 and M.sub.3 is made substantially equal to the difference between the distance L.sub.1 and the known distance L.sub. 2.

REFERENCES:
patent: 3683195 (1972-08-01), Johannsmeier
patent: 3710101 (1973-01-01), O'Keefe
patent: 3745358 (1973-07-01), Firtz et al.
patent: 3843916 (1974-10-01), Trotel et al.
patent: 4335313 (1982-06-01), Kreuger
"An Electron Image Projection with Automatic Alignment", Scott, IEEE Trans. on Electron Devices, 22, No. 7, Jul. 1975, pp. 409-413.

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