Electron beam pattern line width measurement system

Radiant energy – Electron energy analysis

Patent

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250397, G01B 714, G01B 1500

Patent

active

047406933

ABSTRACT:
Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.

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Stupian et al., "Auger Microscopy Using Sample Modulation," Rev. of Sci. Inst., vol. 55, No. 1, JA 1984, pp. 92-94.
Davis et al., "E-Beam Line Width and Pattern Location Measurement Tool," IBM Tech. Disc. Bull., vol. 21, No. 1, Je 1978.

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