Electron beam or X-ray reactive image-formable resinous composit

Details Electron beam or X-ray reactive image-formable resinous composit Electron beam or X-ray reactive image-formable resinous composit

1983-06-13

1985-04-23

Kittle, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430942, 430966, 430905, 430326, 20415914, G03C 1495

Patent

active

045130779

ABSTRACT:
There is disclosed an image-formable resinous composition comprising a poly(olefinsulfone) and a matrix polymer, in which the matrix polymer being a novolac phenol resin obtained from:

REFERENCES:
patent: 3916036 (1975-10-01), Gipstein et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4409317 (1984-07-01), Shiraishi
J. Barry and R. Wilbarg, "Post Exposure Baking for Improved Photoresist Adhesion", IBM Technical Disclosure Bulletin, vol. 24, No. 10, Mar. 1982, p. 5160.

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