Electron beam negative working resist composition

Details Electron beam negative working resist composition Electron beam negative working resist composition

1999-09-07

2000-11-28

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430926, G03F 7004

Patent

active

061533548

ABSTRACT:
An electron beam negative working resist composition is diclosed including: (A) an alkali-soluble resin, (B) an acid-crosslinkable substance, (C) an acid generating agent, and (D) a sensitizing substance, the sensitizing substance (D) being a substance which serves to accumulate electrons or energy through electron beam exposure and to reemit the accumulated electrons or energy into a resist film. Thus, the electron beam negative working resist composition can achieve a desired high sensitivity.

REFERENCES:
patent: 5296332 (1994-03-01), Sachdev et al.
patent: 5302725 (1994-04-01), Kaji et al.

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