Electron beam microscope using electron beam patterns

Details Electron beam microscope using electron beam patterns Electron beam microscope using electron beam patterns

1997-10-01

1999-12-21

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250307, 250357, G01N 2300, H01J 3726

Patent

active

060052473

ABSTRACT:
An electron beam microscope includes an electron beam pattern source, a vacuum enclosure, electron optics, a detector and a processor. The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen. The electron optics directs the sequence of electron beam patterns to the specimen. The detector detects a result of an interaction between each of the electron beam patterns and the specimen and produces a sequence of detector signals. The processor, in response to the sequence of detector signals, generates an image including a pixel value representative of each of the illuminated of pixels on the specimen. The electron beam microscope preferably includes a deflector for deflecting each of the electron beam patterns relative to the specimen.

REFERENCES:
patent: 4460831 (1984-07-01), Oettinger et al.
patent: 4820927 (1989-04-01), Langner et al.
patent: 4906894 (1990-03-01), Miyawaki et al.
patent: 4970392 (1990-11-01), Oettinger et al.
patent: 5039862 (1991-08-01), Smith et al.
patent: 5557105 (1996-09-01), Honjo et al.
patent: 5684360 (1997-11-01), Baum et al.
patent: 5799104 (1998-08-01), Nakamura et al.
Semiconductor on Glass Photocathodes for High Throughput Maskless Electron Beam Lithography by Baum et al, 41st Electron Ion & Photon Beam Nanolithography Conference, 1997.
J. E. Schneider et al. Semiconductor on Glass Photocathodes as High Performance Sources for Parallel Electron Beam Lithography.
Coulomb effect in cell projection lithography, by Sohda et al. J. Vac. Sci. Technol. B, vol. 13, No. 6 Nov./Dec. 1995 pp. 2419-2423.
Recent Progress in Electron-Beam Cell Projection Technology Yamashita et al. Jpn. J. Appl. Phys. vol. 35 1996 Pt. 1 No. 12 B pp. 6404-6414.

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