Electron beam lithography system and method

Details Electron beam lithography system and method Electron beam lithography system and method

1991-09-25

1994-08-02

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 430 5, 2504921, 2504922, 2504923, 2505051, A61K 2702

Patent

active

053342828

ABSTRACT:
An electron beam lithography system and method which provide an in-plane current density distribution of an electron beam focussed onto a specimen so as to prevent a proximity effect and space charge effect.

REFERENCES:
patent: 4158140 (1979-06-01), Nakasuji
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4344153 (1982-08-01), Nishida et al.
patent: 4520269 (1985-05-01), Jones
patent: 4698509 (1987-10-01), Wells et al.
patent: 4812962 (1989-03-01), Witt
patent: 4947413 (1990-08-01), Jewell et al.
patent: 4998020 (1991-03-01), Misaka et al.

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